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Experimental facilities

Experimental Facilities FMC

Thermomechanical testing

  • Mechanical deformation machine INSTRON 1362 with thermal chamber (100N - 100kN, -50C to +150C)
  • Servohydraulic deformation machine INSTRON 8872 with thermal chamber INSTRON (100N - 25kN, -100C to +550C, <100Hz)
  • Electrodynamical linear-torsion deformation machine INSTRON ElectroPuls E10000 with thermal chamber and videoextensometer AVE2 (+- 10 kN dynamic, +- 7 kN static, +- -100C to +350C, up to 100Hz)
  • SMA wire tester Walter&bai (100N,500N,5kN, 2000 mm/min) with Peltier furnace (-35C to +180C) with videoextensometer and integrated resistivity measurement system
  • Dedicated self developed PC controlled miniature screw driven deformation rigs for in-situ experiments on thin SMA filaments
  • In-house developed device for an in-situ inspection of NiTi textiles consisting of a scanning head and biaxial tensile machine. The scanning head is equipped with optical CCD camera, infrared camera and a 2D laser
  • Digital Image Correlation systems VIC-3D, Mercury RT with cameras (fast - MCR-2048-165, 2/3” sensor, 2MPx @ 165 fps, high resolution - Stingray 5 Mpx @ 10 fps)
  • Optical furnace (four water cooled rectangular-shaped parabolic reflectors (350 x 80 mm) equiped with 2 kW heat radiation sources)
  • Dynamical mechanical analysis - DMA 850 - TA Instruments
  • Thermomechanical Analyzer - Linseis TMA PT 1600
  • Nanoindetor FemtoTools FT-NMT04 IN-SITU SEM

Material characterisation

  • Optical microscope OPTON with Nomarski interference contrast and image analyser LUCIA
  • Optical microscope Zeiss Imager.Z1m with Nomarski interference contrast
  • Digital microscopes
    • KEYENCE VHX 7000 + VHX7100
    • KEYENCE VHX 7000 + VHX7020
  • Thermal cameras
    •  Infrared camera FLIR A40M
    • Cooled infrared camera - Infratec ImageIR 8300
  • Calorimetrs
    • Differential scanning calorimetry - Linkam DSC 600
    • Differential scanning calorimetry - Discovery DSC 25

Alloy casting and single crystal growth

  • Bridgman technique resistance heated crystal growth furnace Granat ((IKAN, Russia), working under vacuum (10-3 Pa), inert or reduction temperature
  • Furnaces for sample annealing, shape setting and other thermal treatments under vacuum or inert gas atmosphere
  • Laminating Hot Press 500°C or 750°C 24T

Further equipment

  • Laser profilometer
  • Multiple National Instruments DAQ and CompactRIO
  • Laser engraving machine LASER Station ROD 20

Experimental facilities MSM

Magnetometer Cryogenics

Scanning electron microscopy facility TESCAN FERA III and atomic force microscope  AFM  Bruker Dimension ICON , which belong to the Laboratory FUNBIO-SAFMAT, provide research services in the area of analysis of microstructure and chemical composition of materials and characterisation of material surfaces.

Experimental Facilities MNB

Plasma Enhanced Linear Microwave Chemical Vapour Depostion system

This unique system offers many advantages over classical resonance cavity based MW PECVD systems, which require high growth temperatures (>600°C) and are fundamentally restricted in deposition area due by the incoming MW frequency and cavity design. This system is not restricted by the incoming MW frequency and therefore can produce diamond (typically NCD) uniformly over large areas. In addition to the above mentioned differentiating factors, the system operates at lower pressures (<1mBar). When all the above factors are coupled together with a well-tuned chemistry, diamond growth at temperatures down to 150°C is enabled. The ability to deposit diamond at these low temperatures opens up the possible range of substrates which can be deposited on to materials such as plastics, which in a standard MW PECVD system is not possible. Also, due to the diffuse nature of the plasma 3D objects (such as coronary stents) can be coated. In its current format the system is capable of producing intrinsic diamond layers as well as boron doped layers.

Seki Technotron AX5010 Microwave Plasma CVD Reactor

This commercially available 1,5 kW CVD reactor is used for the growth of high quality intrinsic and boron-doped diamond films. The reactor is capable of producing nanocrystalline (NCD) and microcrystalline (MCD) diamond layers on a variety of substrates as well as monocrystalline diamond (SCD). The system also allows the creation of intense oxygen and hydrogen plasmas for functionalization of diamond substrates.

 

Other experimental equipment

  • Centrifuge epenedorf miniSpin plus
  • Sonicator Hielscher UP400S
  • Spin coater Laurell WS-400-6NPP
  • Stereomikroskop Inraco STM 1562 323O
  • Digital Scales Radwag XA 52/2X
  • Willamson IR pyrometer 

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