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Experimental facilities

Experimental Facilities FMC

Thermomechanical testing

  • Mechanical deformation machine INSTRON 1362 with thermal chamber (100N - 100kN, -50C to +150C)
  • Servohydraulic deformation machine INSTRON 8872 with thermal chamber INSTRON (100N - 25kN, -100C to +550C, <100Hz)
  • Electrodynamical linear-torsion deformation machine INSTRON ElectroPuls E10000 with thermal chamber and videoextensometer AVE2 (+- 10 kN dynamic, +- 7 kN static, +- -100C to +350C, up to 100Hz)
  • SMA wire tester Walter&bai (100N,500N,5kN, 2000 mm/min) with Peltier furnace (-35C to +180C) with videoextensometer and integrated resistivity measurement system
  • Dedicated self developed PC controlled miniature screw driven deformation rigs for in-situ experiments on thin SMA filaments
  • In-house developed device for an in-situ inspection of NiTi textiles consisting of a scanning head and biaxial tensile machine. The scanning head is equipped with optical CCD camera, infrared camera and a 2D laser
  • Laser profilometer
  • Digital Image Correlation systems VIC-3D, Mercury RT with cameras (fast - MCR-2048-165, 2/3” sensor, 2MPx @ 165 fps, high resolution - Stingray 5 Mpx @ 10 fps)
  • In-house developed bulge tester driven by air pressure (max. air pressure - 5 bar, apperture diameter - 100 mm)
  • Optical furnace (four water cooled rectangular-shaped parabolic reflectors (350 x 80 mm) equiped with 2 kW heat radiation sources)

Material characterisation

  • Optical microscope OPTON with Nomarski interference contrast and image analyser LUCIA
  • Optical microscope Zeiss Imager.Z1m with Nomarski interference contrast
  • Thermal infrared camera FLIR A40M
  • Differential scanning calorimetry - Linkam DSC 600

Alloy casting and single crystal growth

  • Bridgman technique resistance heated crystal growth furnace Granat ((IKAN, Russia), working under vacuum (10-3 Pa), inert or reduction temperature
  • Furnaces for sample annealing, shape setting and other thermal treatments under vacuum or inert gas atmosphere

Experimental facilities MSM

Magnetometer Cryogenics

Scanning electron microscopy facility TESCAN FERA III and atomic force microscope  AFM  Bruker Dimension ICON , which belong to the Laboratory FUNBIO-SAFMAT, provide research services in the area of analysis of microstructure and chemical composition of materials and characterisation of material surfaces.

Experimental Facilities MNB

CVD apparatus

Plasma Enhanced Linear Microwave Chemical Vapour Depostion system (PELMWCVD)System description:

 

This unique system offers many advantages over classical resonance cavity based MW PECVD systems, which require high growth temperatures (>600°C) and are fundamentally restricted in deposition area due by the incoming MW frequency and cavity design. Our system is not restricted by the incoming MW frequency and therefore can produce diamond (typically NCD) uniformly over large areas. Another major difference compared with other classical MW PECVD techniques is the use of high-frequency pulsed microwaves, which due to nonlinear absorption enables an increase in the plasma concentration which leads to an increase in atomic hydrogen and thus maximizing growth rates and material quality. In addition to the above mentioned differentiating factors, the system operates at much lower pressures (<1mBar). When all the above factors are coupled together with a well-tuned chemistry, diamond growth at temperatures down to 150°C is enabled. The ability to deposit diamond at these low temperatures opens up the possible range of substrates which can be deposited on to materials such as plastics, which in a standard MW PECVD system is not possible. Also, due to the diffuse nature of the plasma 3D objects (such as coronary stents) can be coated.

In its current format the system is capable of producing intrinsic diamond layers as well as boron doped layers. Finally the system can be used for functionalisation of nanodiamond particles and layers in plasmas (Hydrogen and Oxygen).

Typical system parameters:

Connected gases:       H2, CH4, CO2, TMB, O2, Ar
Doping levels:             0 to 10 000 ppm B / C
Working pressure:      ~ 1 mBar
Maximum power:      10kW pulsed mode and 3kW CW mode
Substrates:                  Silicon, glass, quartz, titanium, stainless steel, plastics
Substrate table:          20cm dia with active temp control (cooling and heating)

Seki Technotron AX5010 Microwave Plasma CVD ReactorSystem description:

This commercially available 1,5 kW CVD reactor is used for the growth of high quality intrinsic and boron-doped diamond films. The reactor is capable of producing nanocrystalline (NCD) and microcrystalline (MCD) diamond layers on a variety of substrates as well as monocrystalline diamond (SCD). The system also allows the creation of intense oxygen and hydrogen plasmas for functionalization of diamond substrates.

Typical system parameters:

Connected gases:       H2, CH4, TMB, O2, Ar
Doping levels:             15 000 ppm B / C
Working pressure:      30 to 120 mBar
Maximum power       1.5 kW CW mode
Substrates:                  Silicon, quartz and titanium
Substrate table:          8cm dia with active temp control (heating)

NT-MDT NTEGRA Prima Scanning Probe Microscope

Atomic Force Microscopy (AFM) enables 3D visualization of surfaces on the nanometer scale. Within the MNB group AFM is used to study diamond layers and nanodiamond particles. Statistical methods developed by within the group, allows evaluation of grain sizes of nanocrystalline layers or the number and size of nanoparticles. In addition to morphological studies the apparatus is also used to study conductive surfaces via scanning tunneling microscopy (STM), magnetic measurements and work function measurements.

Other experimental equipment

  • Centrifuge epenedorf miniSpin plus
  • Sonicator Hielscher UP400S
  • Spin coater Laurell WS-400-6NPP
  • Stereomikroskop Inraco STM 1562 323O
  • Digital Scales Radwag XA 52/2X
  • Willamson IR pyrometer 

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